Gold Member Since 2016
Audited Supplier
Aerospace Long March Arimt Technology Co., Ltd.

Sputtering Targets, Tisi Targets, Planar Targets manufacturer / supplier in China, offering Planar Tisi Sputtering Targets, Powder Metallurgy Chromium Sputtering Targets, Hip Chromium Targets and so on.

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Supplier Homepage Product sputtering target Planar Tisi Sputtering Targets

Planar Tisi Sputtering Targets

FOB Price: US $100 / Piece
Min. Order: 1 Piece
Min. Order FOB Price
1 Piece US $100/ Piece
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Port: Tianjin, China
Production Capacity: 20000PCS/Year
Payment Terms: L/C, T/T, D/P

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Basic Info
  • Model NO.: Ruitech04
  • Transport Package: Wooden Case, Vacuum Package
  • Origin: Tianjin
  • Trademark: Ruitech
  • Specification: Dia300
  • HS Code: 8486909900
Product Description

Planar Tisi sputtering Targets

Together, titanium and silicon (TiSi) make an outstanding team for nitride hard material coatings. Silicon guarantees excellent resistance to oxidation while the presence of titanium ensures particularly hard coatings. When combined, the two elements are wear resistant even at very high temperatures.
TiSiN-coated tools are extremely wear-resistant and permit high machining speeds. Machining operations without the use of coolants also pose no problem. Even tough materials such as nickel-based alloys and titanium-based materials are easy to machine using titanium-silicon nitride-coated tools.
The titanium nitride crystals are embedded in an amorphous Si3N4 matrix and together form a ceramic nanocomposite coating. TiSiN layers are applied to the tool using the reactive magnetron sputtering or arc evaporation process.
Our targets and cathodes are available from stock in the following typical material compositions in various dimensions:
TiSi 85 / 15 %
TiSi 80 / 20 %
TiSi 75 / 25 %
or customized
The most important details at a glance
Titanium/silicon content [at%]85 / 1580 / 2075 / 25
Purity [%]99.899.899.8
Guaranteed density [g/cm3]4.404.374.35
Grain size [·m]100100100

Our optimum microstructure. Your perfect coating.

Because we take particular care when mixing the powder, the microstructure of our materials is significantly more homogeneous and fine-grained than in materials produced using a melting process. This means that significantly fewer droplets form on your product. The result: outstandingly smooth coating layers.
Planar Tisi Sputtering Targets
Why us?
1)we own the most advanced Hot Isostatic pressing system (HIP)  which imported from Avure in Sweden.

2)we have got two patent for Cr & TiAl rotary target.

3)"Customers first, quality first" is our tenet. Obeying quality policy "providing high quality and competitive products to satisfy user requirement", the quality of products are consummated and transcended constantly. Technology and credit oriented, we afford the highest quality products and perfect services. Cr,  Si-Al, Ti-Al, Cr-Al, Cr-Si etc flat and rotary sputtering targets are provided at present.
Professional packing:
Planar Tisi Sputtering Targets
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