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Aerospace Long March Arimt Technology Co., Ltd.

Tisi Targets, Sputtering Targets, Tisi manufacturer / supplier in China, offering Tisi Sputtering Targets, Powder Metallurgy Chromium Sputtering Targets, Hip Chromium Targets and so on.

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Tisi Sputtering Targets

FOB Price: US $80-800 / Set
Min. Order: 1 Set
Min. Order FOB Price
1 Set US $80-800/ Set
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Production Capacity: 20000PCS/Year
Transport Package: Wooden Case, Vacuum Package
Payment Terms: L/C, T/T, D/P

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Basic Info
  • Model NO.: Ruitech11
  • Specification: Dia300*2000mm
  • HS Code: 8486909900
  • Trademark: Ruitech
  • Origin: Tianjin
Product Description

Powder metallurgy process for TiSi sputtering targets
Optimum protection for important components.

Hot isostatic pressing tube of target products compared with melting tube target, has no air hole, inclusion, uniform composition, small grain, etc; Compared with the spraying pipe material, hot isostatic pressing pipe target product high purity, low oxygen content, high density, coating as well as good continuity.
The hard material coatings TiSi optimally protectengine components such as piston rings 
against premature wear and consequently extend the useful life of important engine parts. TiSi is used as a bonding layer for DLC coatings (Diamond Like Carbon), for example on bucket tappets. Furthermore, when used as a decorative coating, our TiSi gives watches, electronic goods, operating elements on appliances and a range of other products an attractive sheen.
Furthermore, when used as a decorative coating, our chromium gives watches, electronic goods, operating elements on appliances and a range of other products an attractive sheen.
Decorative and tools TiSi coatings are applied using the magnetron sputtering method. Wear resistant and adhesive layers can also be produced using the arc evaporation method.

High ductility. Long service life.

During the coating process, our sputtering targets and arc cathodes have to withstand a lot. The material at the edge of the target can be exposed to forces of up to one tonne during coating. Whereas brittle materials would break under the strain, the presence of the element aluminum makes our material particularly ductile. To guarantee the ductility of the TiAl targets, the aluminum must be extremely evenly distributed. That is why we mix our titanium-aluminum powder very carefully before compacting the material using a forming process. As a result, the microstructure of our materials is significantly more homogeneous and fine-grained than in materials produced using a melting process. The benefit to you of our powder metallurgical production process: particularly breakage-resistant, long-lived targets.
Tisi Sputtering Targets
Why us?
1)we own the most advanced Hot Isostatic pressing system (HIP)  which imported from Avure in Sweden.
Tisi Sputtering Targets
2)we have got two patent for Cr & TiAl rotary target.
Tisi Sputtering Targets

3)"Customers first, quality first" is our tenet. Obeying quality policy "providing high quality and competitive products to satisfy user requirement", the quality of products are consummated and transcended constantly. Technology and credit oriented, we afford the highest quality products and perfect services. Cr,  Si-Al, Ti-Al, Cr-Al, Cr-Si etc flat and rotary sputtering targets are provided at present.
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