Gold Member Since 2016
Audited Supplier
Aerospace Long March Arimt Technology Co., Ltd.

Sputtering Targets, Chromium Targets, Rotary Targets manufacturer / supplier in China, offering Powder Metallurgy Chromium Sputtering Targets, Hip Chromium Targets, Rotary Planar Tial Sputtering Targets and so on.

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Supplier Homepage Product sputtering target Powder Metallurgy Chromium Sputtering Targets

Powder Metallurgy Chromium Sputtering Targets

FOB Price: US $500-1,000 / Piece
Min. Order: 1 Piece
Min. Order FOB Price
1 Piece US $500-1,000/ Piece
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Port: Tianjin, China
Production Capacity: 20000PCS/Year
Payment Terms: L/C, T/T, D/P

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Basic Info
  • Model NO.: Ruitech01
  • Transport Package: Wooden Case, Vacuum Package
  • Origin: Tianjin
  • Trademark: Ruitech
  • Specification: Dia170*1800
  • HS Code: 8112290000
Product Description

powder metallurgy sputtering target Chromium targets for decorative coating
Optimum protection for important components.

The hard material coatings chromium (Cr) and chromium nitride (CrN) optimally protectengine components such as piston rings against premature wear and consequently extend the useful life of important engine parts. Chromium is used as a bonding layer for DLC coatings (Diamond Like Carbon), for example on bucket tappets. Furthermore, when used as a decorative coating, our chromium gives watches, electronic goods, operating elements on appliances and a range of other products an attractive sheen.
Furthermore, when used as a decorative coating, our chromium gives watches, electronic goods, operating elements on appliances and a range of other products an attractive sheen.
Decorative chromium coatings are applied using the magnetron sputtering method. Wear resistant and adhesive layers can also be produced using the arc evaporation method.
We supply rotary and planar arc cathodes as well as planar sputtering targets in the quality variants High Purity (HP) and Ultra High Purity (UHP):
The most important details at a glance
ChromiumUHPHP
Metal purity [%]99.9599.8
Metallic impurities [μg/g]Fe
Si
other
300
100
150
1 500
500
400
Non-metallic impurities [μg/g]O
N
C
300
200
100
1 000
200
300
Guaranteed density [g/cm3]7.127.12
Grain size [μm]100100
Thermal conductivity [W/(m·K)]max. 250max. 150
Coefficient of thermal expansion [1/K]· 10-6· 10-6
 

Guaranteed purity.

The purer the coating material, the better the quality of the hard material layer. From the very outset, we use only the finest powder which we mix in our own equipment to ensure outstanding material purity. We monitor every step - from the powder through to the finished product - and make sure that only targets with the specific guaranteed density, purity and a homogeneous microstructure are shipped from our factories.
As a leading manufacturer of sputtering targets, we perform every stage of the production process ourselves. From the mixing and compacting of the metal powder through to the forming, machining and bonding of our targets: including the development of new materials to optimize your coating processes and films. And naturally we also verify the quality of our targets using state-of-the-art measuring methods.

You want the perfect coating? We create it.

There's one thing we know perfectly well: In the PVD coating process, everything must fit together perfectly. Only through the perfect combination of high-quality sputtering targets and arc cathodes, coupled with carefully chosen process parameters, is it possible to create a coating that precisely meets your requirements. And this cooperation with our customers and numerous development institutes results in a constant flow of new coating materials.
Are you looking for the perfect coating? Take advantage of our long-standing experience and our extensive database of chemical compositions and production processes. Our team develops our sputtering targets and arc cathodes continually and improves the following material and coating properties:
  1. Grain size and microstructure
  2. Ductility
  3. Material hardness
  4. Resistance to oxidation
  5. Coefficient of friction
Temperature resistance
Because our raw material consists of tungsten carbide powder with a minimum grain size, the microstructure of our targets is very fine and homogeneous. The advantage: The target material is eroded uniformly during the coating process and ensures that you benefit from smoother coatings. Thanks to a further optimization of the microstructure, we are also able to produce arc cathodes made of tungsten carbide.
Powder Metallurgy Chromium Sputtering Targets
Powder Metallurgy Chromium Sputtering Targets
Powder Metallurgy Chromium Sputtering Targets



Powder Metallurgy Chromium Sputtering Targets
Why us?

  Ruitech Company is a new material based industry high-tech enterprises. The company is headquartered in Tianjin Economic and Technological Development Zone.  The company establishes several production bases in Tianjin, Shanghai, Shandong, Hebei, Inner Mongolia. Our main products include: carbon / carbon composite materials and specialty graphite products, stitch-bonded fabric and prepreg, fiber composite materials and products, sealing and damping products, powder metallurgy products, specialty coatings, which are mainly used in aerospace new energy, environmental protection, transportation and other fields.

         Long March Ruitech Co., Ltd. Project Department of powder metallurgy products, is based on powder metallurgy products for aerospace research and production technology, the establishment of the professional sputtering targets of high-tech R & D and production units. We can provide sputtering targets with steady quality, diversified composition and specification serialization using hot isostatic pressing (HIP), cold isostatic pressing (CIP) and vacuum sintering processes. And we also offer combining targets and sputtering metal and binding services according to customer require.
"Customers first, quality first" is our tenet. Obeying quality policy "providing high quality and competitive products to satisfy user requirement", the quality of products are consummated and transcended constantly. Technology and credit oriented, we afford the highest quality products and perfect services. Cr, Mo, NbO, Si-Al, Ti-Al, Cr-Al, Ni-Cr, W-Ti, Cr-Si etc flat and rotary sputtering targets are provided at present.

          Based on research and production technology of aerospace powder metallurgy materials, special metallic material and processing division of Ruitech Company is a professional research and manufacture high-tech department of sputtering targets. We can provide sputtering targets with steady quality, diversified composition and specification serialization using hot isostatic pressing (HIP), cold isostatic pressing (CIP) and vacuum sintering processes. And we also offer combining targets and sputtering metal and binding services according to customer require. 
 
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