Rotary and Planar Monb Targets
|FOB Price:||US $4,000 / Piece|
|Min. Order:||1 Piece|
|Min. Order||FOB Price|
|1 Piece||US $4,000/ Piece|
|Payment Terms:||L/C, T/T, D/P|
- Model NO.: Ruitech05
- Transport Package: Wooden Case, Vacuum Package
- Origin: Tianjin
- Trademark: Ruitech
- Specification: Dia300
- HS Code: 8486909900
Rotary and Planar Monb TargetsMolybdenum-niobium (MoNb) is used in touchpanels as particularly corrosion resistant wirings of the ITO sensor. You can rely on the quality of our MoNb sputtering targets. Because we are the only manufacturer of sputtering targets to perform every stage of the production process ourselves. From the purest metal powder through to the finished sputtering target. In our own bonding shops in Asia we fully prepare our MoNb targets for you. We deliver our MoNb planar targets and rotary targets in all common sizes.
Molybdenum-Niobium. For corrosion-resistant layers in touch panels.
|The most important facts|
|Density [%]||≥ 99.5%|
|Purity [%]||> 99.97|
|Coefficient of thermal expansion [ppm/K]||5.38|
|Thermal conductivity [W/(m· K)]||103|
|Electrical conductivity [MS/m]||13.5 MS/m|
|Microstructure||single-phase material, oxide-free|
In other MoNb targets, you will find molybdenum phases and niobium phases next to each other. This makes it a two-phase material. In contrast, our molybdenum-niobium is a single-phase material. It is made up of mixed crystal. We call this newly developed materialMoNb Solid Solution. This means that the 100% homogeneous target material will subsequently become your 100% homogeneous thin film.
1)we own the most advanced Hot Isostatic pressing system (HIP) which imported from Avure in Sweden.
2)we have got two patent for Cr & TiAl rotary target.
3)"Customers first, quality first" is our tenet. Obeying quality policy "providing high quality and competitive products to satisfy user requirement", the quality of products are consummated and transcended constantly. Technology and credit oriented, we afford the highest quality products and perfect services. Cr, Si-Al, Ti-Al, Cr-Al, Cr-Si etc flat and rotary sputtering targets are provided at present.